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SINAM Nano-Seminar Announced Optical Field Synthesis and Analysis Using Diffractive Optics Prof. Byoungho Lee - School of EE, Seoul National University, Korea Friday, January 26, 2007 ABSTRACT This talk will consist of two parts – optical field synthesis and analysis. Regarding the optical field synthesis, Prof. Lee eill discuss the design methodology of diffractive optical elements, especially to generate three-dimensional optical fields or intensity profiles. Genetic feedback tuning loop will also be explained, which can enable dynamic optical pattern generation compensating aberrations of optical systems and optimizing dynamic spatial light modulator responses. Regarding the optical field analysis, Prof. Lee will discuss pseudo-Fourier modal analysis (PFMA) to simulate nano photonic structures. The use of PFMA and rigorous coupled mode analysis (RCWA) with parallel computing will be discussed and several simulation examples will be shown such as beaming of laser using surface plasmon resonance and near-field holography. ABOUT PROF. LEE Byoungho Lee received his PhD degree from EECS, UC Berkeley in 1993. Since 1994, he has been with the School of Electrical Engineering, Seoul National University, Korea, where he is now a full professor. He is a Fellow of SPIE and a Fellow of the Optical Society of America (OSA). Currently, he is serving in the Award Committee and in the Board of Directors of the OSA. He has served or is serving in the editorial board of Applied Optics, Optical Fiber Technology, Japanese Journal of Applied Physics, and the Journal of the Society for Information Display. In 2002 he received the Presidential Young Scientist Award of Korea. He has published more than 180 international journal papers and more than 300 international conference papers including more than 30 invited papers. His research fields are diffractive optics, three-dimensional display and fiber lasers.
Link to Optical Engineering and Quantum Electronics Lab View the flyer for this event (PDF, 21KB)
Seminar presented by the Center for Scalable and Integrated Nanomanufacturing
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